SF-100 XTREME | Canada Analytical & Process Technologies

SF-100 XTREME
If you need a complete maskless lithography system to do advanced research or photomask fabrication, look no further than the SF-100 XTREME. This system comes with everything you need to do high precision, quick turnaround maskless photoresist patterning. Through advanced system design, important process variables such as exposure wavelength, pixel size and exposure energy level are easily chosen by the user so the system can work within your existing process and be compatible with your existing materials.

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