The new SF-100 XCEL has been developed for a wide range of lithography applications. IMP has taken the same UV optics that are used on other SF-100 models and packaged them in a simple, very reliable system that can provide for features as small as 5 microns in size.

Since these processes use standard photoresists, polyimides, or SU8 materials, the SF-100 XCEL integrates easily into your existing photolithography line. The applications for this system are endless. Use the SF-100 XCEL to train students in basic processing, pattern a variety of features for non-critical applications, and even perform lithography on curved substrates. All of these capabilities are available to you at a low system price.