HF-700
Enables management of hydrofluoric concentrations in diluted sulfuric acid and hydrogen peroxide at the ppm level. Management of hydrofluoric concentrations at the ppm level is extremely important for the solution of diluted sulfuric acid, hydrogen peroxide and a small amount of hydrofluoric acid that plays an effective role in the removal of the polymer residue following the etching process. If the concentration is too low, the polymer removal effect is weakened. If it is too high, it causes excessive etching. The HF-700 stabilizes hydrofluoric concentrations on the order of ppm in diluted sulfuric acid and hydrogen peroxide to enable continuous measurement and allow effective process management.

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